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Band structure engineering and vacancy induced metallicity at the GaAs-AlAs interface
Author(s) -
Mousumi Upadhyay Kahaly,
Safdar Nazir,
Udo Schwingenschlögl
Publication year - 2011
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.3643049
Subject(s) - heterojunction , materials science , band gap , condensed matter physics , semimetal , epitaxy , classification of discontinuities , optoelectronics , substrate (aquarium) , thin film , vacancy defect , electronic band structure , electronic structure , nanotechnology , physics , layer (electronics) , mathematical analysis , oceanography , mathematics , geology
We study the epitaxial GaAs-AlAs interface of wide gap materials by full-potential density functional theory. AlAsthin films on a GaAs substrate and GaAsthin films on an AlAs substrate show different trends for the electronic band gap with increasing film thickness. In both cases, we find an insulating state at the interface and a negligible charge transfer even after relaxation. Differences in the valence and conduction band edges suggest that the energy band discontinuities depend on the growth sequence. Introduction of As vacancies near the interface induces metallicity, which opens great potential for GaAs-AlAs heterostructures in modern electronics

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