Unipolar and bipolar operation of InAs/InSb nanowire heterostructure field-effect transistors
Author(s) -
Henrik A. Nilsson,
Philippe Caroff,
Erik Lind,
MatsErik Pistol,
Claes Thelander,
LarsErik Wernersson
Publication year - 2011
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.3633742
Subject(s) - heterojunction , nanowire , quantum tunnelling , optoelectronics , band gap , materials science , condensed matter physics , field effect transistor , band bending , transistor , impact ionization , voltage , chemistry , ionization , physics , quantum mechanics , ion , organic chemistry
In this paper, we discuss the electrical properties of InAs/InSb heterostructure field-effect transistors (HFETs) fabricated by nanowire technology. The nanowire technology enables the growth of non-lattice matched devices, such as InSb on InAs. 5,6 We use a lateral transistor configuration with transistors formed to the InAs/InSb segments. We consider the InAs/InSb field-effect transistor (FET) and discuss the main transport mechanisms, and the data are compared to n-type InAs and n-type InSb FETs. 7 We demonstrate unipolar n-type operation of the HFET and determine the height of the heterostructure junction. Furthermore, we show that the HFET may operate as a bipolar device based on hole transport in the InSb, with the possibility to observe bandto-band tunneling across the broken bandgap heterointerface.
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom