High-field fast-risetime pulse failures in 4H- and 6H-SiC pn junction diodes
Author(s) -
Philip G. Neudeck,
C. Fazi
Publication year - 1996
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.362922
Subject(s) - diode , materials science , optoelectronics , breakdown voltage , silicon carbide , reverse leakage current , voltage , pin diode , leakage (economics) , safe operating area , avalanche diode , power semiconductor device , electrical engineering , schottky diode , economics , metallurgy , macroeconomics , engineering
We report the observation of anomalous reverse breakdown behavior in moderately doped (2–3×1017 cm−3) small‐area micropipe‐free 4H‐ and 6H‐SiC pn junction diodes. When measured with a curve tracer, the diodes consistently exhibited very low reverse leakage currents and sharp repeatable breakdown knees in the range of 140–150 V. However, when subjected to single‐shot reverse bias pulses (200 ns pulsewidth, 1 ns risetime), the diodes failed catastrophically at pulse voltages of less than 100 V. We propose a possible mechanism for this anomalous reduction in pulsed breakdown voltage relative to dc breakdown voltage. This instability must be removed so that SiC high‐field devices can operate with the same high reliability as silicon power devices.
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