Open AccessEfficient E-Beam Lithography Exposure Strategies for Diffractive X-ray Optics
Author(s) -
Vitaliy A. Guzenko,
J. Romijn,
Joan VilaComamala,
Sergey Gorelick,
Christian Dávid,
Ian McNulty,
Catherine Eyberger,
Barry Lai
Publication year - 2011
Publication title -
aip conference proceedings
Language(s) - Uncategorized
Resource type - Conference proceedings
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.3625312
Subject(s) - lithography , optics , electron beam lithography , resist , x ray lithography , beam (structure) , multiple exposure , fabrication , stencil lithography , materials science , resolution (logic) , computer science , physics , nanotechnology , artificial intelligence , layer (electronics) , medicine , alternative medicine , pathology
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