Open AccessTemperature dependence of the biaxial modulus, intrinsic stress and composition of plasma deposited silicon oxynitride films
Author(s) -
D. R. Harding,
Linus U. T. Ogbuji,
Mathieu J. Freeman
Publication year - 1995
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.360263
Subject(s) - silicon oxynitride , materials science , silicon , silicon nitride , oxygen , annealing (glass) , nitrogen , chemical vapor deposition , hydrogen , composite material , analytical chemistry (journal) , chemistry , metallurgy , nanotechnology , organic chemistry , chromatography
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