Open AccessRegrowth of oxide-embedded amorphous silicon studied with molecular dynamics
Author(s) -
E. Lampin,
Christophe Krzeminski
Publication year - 2011
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.3596815
Subject(s) - nanostructure , amorphous solid , silicon , materials science , nanodevice , molecular dynamics , annealing (glass) , amorphous silicon , chemical physics , epitaxy , oxide , silicon oxide , nanotechnology , crystalline silicon , optoelectronics , crystallography , layer (electronics) , chemistry , computational chemistry , composite material , metallurgy , silicon nitride
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