Intensity dependence of the third-harmonic-generation efficiency for high-power far-infrared radiation in n-silicon
Author(s) -
Matthias Urban,
Ch. Nieswand,
Michael Siegrist,
F. Keilmann
Publication year - 1995
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.358944
Subject(s) - silicon , intensity (physics) , far infrared , infrared , radiation , radiant intensity , laser , materials science , wavelength , energy conversion efficiency , optics , optoelectronics , second harmonic generation , far infrared laser , physics
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