Open AccessResponse to “Comment on ‘Threshold voltage control of oxide nanowire transistors using nitrogen plasma treatment’” [Appl. Phys. Lett. 98, 176101 (2011)]
Author(s) -
JinWoo Park,
HongKoo Baik,
Taekyung Lim,
Sanghyun Ju
Publication year - 2011
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.3584002
Subject(s) - nanowire , threshold voltage , materials science , transistor , plasma , oxide , voltage , nitrogen , optoelectronics , nanotechnology , physics , quantum mechanics , metallurgy
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