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Spatial distribution of recombination centers in GaAs:Te: Effects of the doping level
Author(s) -
A. Castaldini,
A. Cavallini,
Beatrice Fraboni,
Bianchi Méndez,
Javier Piqueras
Publication year - 1994
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.357783
Subject(s) - surface photovoltage , wafer , electron beam induced current , crystallographic defect , materials science , doping , impurity , diffusion , scanning electron microscope , carrier lifetime , semiconductor , condensed matter physics , optoelectronics , analytical chemistry (journal) , silicon , crystallography , chemistry , physics , organic chemistry , quantum mechanics , spectroscopy , composite material , thermodynamics , chromatography
The distribution in liquid-encapsulated-Czochralski (LEC) GaAs:Te wafers of point and complex defects has been investigated together with their influence on the minority-carrier diffusion length L. Three wafers with different Te-doping concentration (2.2 X 10(17), 4.5 X 10(17), and 1.5 X 10(18) cm-3) have been studied by means of the electron-beam-induced-current (EBIC) mode of scanning electron microscopy and of the surface photovoltage (SPV) method. The morphology and electrical activity of the defects observed across each wafer have been correlated to the formation and distribution of deep electronic levels, which are significantly affected by the tellurium concentration. The diffusion length has been found to be mainly controlled by deep levels associated with dislocations. EBIC localized measurements of L and of the net ionized free-carrier concentration provide evidence for the influence of Te concentration on impurity segregation at complex defects

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