Viscosity and elastic constants of amorphous Si and Ge | Zendy

Ann Witvrouw | Zendy; F. Spaepen | Zendy

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Viscosity and elastic constants of amorphous Si and Ge

Author(s) -

Ann Witvrouw,

F. Spaepen

Publication year - 1993

Publication title -

journal of applied physics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.699

H-Index - 319

eISSN - 1089-7550

pISSN - 0021-8979

DOI - 10.1063/1.355031

Subject(s) - amorphous solid , materials science , thermal expansion , relaxation (psychology) , thermodynamics , enthalpy , viscosity , newtonian fluid , stress relaxation , elastic modulus , chemistry , composite material , crystallography , physics , psychology , social psychology , creep

The biaxial modulus and coefficient of thermal expansion of ion‐beam‐sputtered amorphous Si and Ge thin films were determined from curvature changes induced by differential thermal expansion. Viscous flow was measured by stress relaxation and was found to be Newtonian. The viscosity increased linearly with time as a result of structural relaxation, and its isoconfigurational activation enthalpy was 1.8±0.3 and 2.6±1.3 eV for amorphous Si and Ge, respectively. An atomistic model, based on a chain reaction of broken bond rearrangements, is proposed to describe the observation.

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