Confinement and flow dynamics in thin polymer films for nanoimprint lithography | Zendy

Jérémie Teisseire | Zendy; Amélie Revaux | Zendy; M. Foresti | Zendy; Étienne Barthel | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Confinement and flow dynamics in thin polymer films for nanoimprint lithography

Author(s) -

Jérémie Teisseire,

Amélie Revaux,

M. Foresti,

Étienne Barthel

Publication year - 2011

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.3535614

Subject(s) - nanoimprint lithography , materials science , rheology , relaxation (psychology) , lithography , thin film , nanolithography , glass transition , viscosity , polymer , volumetric flow rate , nanotechnology , flow (mathematics) , newtonian fluid , composite material , optoelectronics , fabrication , mechanics , psychology , social psychology , medicine , alternative medicine , physics , pathology

International audienceIn nanoimprint lithography (NIL) viscous flow in polymeric thin films is the primary mechanism for the generation and the relaxation of the structures. Here we quantify the impact of confinement on the flow rate. Pattern relaxation experiments were carried out above the glass transition temperature as a function of film thickness. The results are adequately fitted by a simple expression for the flow rate valid at all confinements. This expression, based on Newtonian viscosity, should be of use in NIL process design and for the measurement of the rheological properties of confined polymers

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research