Open AccessPublisher’s Note: “X-ray photoelectron spectroscopy study of the chemical interaction at the Pd/SiC interface” [J. Appl. Phys. 108, 093702 (2010)]
Author(s) -
Y. Zhang,
G. Gajjala,
Tommy Hofmann,
L. Weinhardt,
Michael Bär,
Clemens Heske,
M. SeelmannEggebert,
P. Meisen
Publication year - 2011
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.3532951
Subject(s) - x ray photoelectron spectroscopy , interface (matter) , x ray spectroscopy , x ray , materials science , spectroscopy , electron spectroscopy , condensed matter physics , crystallography , analytical chemistry (journal) , chemistry , physics , nuclear magnetic resonance , optics , quantum mechanics , environmental chemistry , gibbs isotherm , adsorption
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom