Open AccessExtraction of contact resistance in carbon nanofiber via interconnects with varying lengths
Author(s) -
Ke Li,
Raymond P. H. Wu,
Patrick Wilhite,
Vinit Khera,
S. Krishnan,
Xuhui Sun,
Cary Y. Yang
Publication year - 2010
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.3527927
Subject(s) - materials science , contact resistance , carbon nanofiber , fabrication , silicon , electrical contacts , scanning electron microscope , composite material , carbon fibers , nanotechnology , nanofiber , nanostructure , electrical resistivity and conductivity , optoelectronics , carbon nanotube , medicine , alternative medicine , engineering , layer (electronics) , pathology , composite number , electrical engineering
A method to extract the contact resistance and bulk resistivity of vertically grown carbon nanofibers (CNFs) or similar one-dimensional nanostructures is described. Using a silicon-compatible process to fabricate a terrace test structure needed for the CNF length variation, the contact resistance is extracted by measuring in situ the resistances of individual CNFs with different lengths and within a small range of diameters using a nanoprober inside a scanning electron microscope. Accurate determination of contact resistances for various combinations of catalysts and underlayer metals can lead to eventual optimization of materials' growth and device fabrication processes for CNF via interconnects. © 2010 American Institute of Physics.
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