Open AccessErratum: ‘‘Model for dry etching of silicon’’ [J. Appl. Phys. 70, 2901 (1991)]
Author(s) -
Masahiko Kojima,
Hisao Kato,
Mitsuru Gatto,
Shigeyoki Morinaga,
Nobuyoshi Ito
Publication year - 1992
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.351404
Subject(s) - silicon , etching (microfabrication) , dry etching , materials science , crystallography , nanotechnology , chemistry , optoelectronics , layer (electronics)
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