Optical temperature measurements on thin freestanding silicon membranes
Author(s) -
Markus Schmotz,
Patrick Bookjans,
Elke Scheer,
P. Leǐderer
Publication year - 2010
Publication title -
review of scientific instruments
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.605
H-Index - 165
eISSN - 1089-7623
pISSN - 0034-6748
DOI - 10.1063/1.3499503
Subject(s) - materials science , nanosecond , silicon , membrane , micrometer , diffraction , thermal diffusivity , optics , grating , thermal , optoelectronics , thermal conductivity , thin film , nanotechnology , laser , composite material , thermodynamics , chemistry , biochemistry , physics
We report on a contactless, all-optical method to derive thermal properties of 340 nm thin, 640×640 μm(2) wide, freestanding silicon membranes. Exploiting the temperature dependent optical transmissivity of 4×10(-3)/K between 300 and 470 K, we are able to measure the temperature of the membrane with millikelvin thermal, micrometer lateral, and nanosecond temporal resolution. Experiments such as the decay of a transient thermal grating with spacings between 5 and 30 μm, measured in first order of diffraction, as well as heat diffusion in a statically heated membrane are reported in this letter. For the latter case an example of a nanostructured membrane by means of focused ion beam milling is given.
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