Fluorocarbon impurities in KrF lasers | Zendy

Helen Hwang | Zendy; Kristopher James | Zendy; Roger K. W. Hui | Zendy; Mark J. Kushner | Zendy

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Fluorocarbon impurities in KrF lasers

Author(s) -

Helen Hwang,

Kristopher James,

Roger K. W. Hui,

Mark J. Kushner

Publication year - 1991

Publication title -

journal of applied physics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.699

H-Index - 319

eISSN - 1089-7550

pISSN - 0021-8979

DOI - 10.1063/1.347555

Subject(s) - excimer , excimer laser , impurity , laser , fluorocarbon , excited state , absorption (acoustics) , materials science , plasma , chemistry , quenching (fluorescence) , analytical chemistry (journal) , atomic physics , fluorescence , optics , physics , organic chemistry , quantum mechanics , chromatography , composite material

Fluorocarbon impurities are known to have deleterious effects on the operation of excimer lasers; however, the sensitivity limits are poorly known. Absorption at 248.9 nm in an e‐beam‐pumped KrF laser has been attributed to CF2, produced by plasma fragmentation of precursor molecules such as CF4. In this paper, the effects of CF4 impurities on the gain of an electron‐beam‐excited KrF laser are investigated theoretically. It is found that the density of KrF(B) significantly decreases and absorption increases when the CF4 concentration exceeds 0.03%. The decrease in the density of KrF(B) is dominantly the result of the interception of precursors to forming the upper laser level, as opposed to direct quenching.

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