Spatially resolved characterization of InGaAs/GaAs quantum dot structures by scanning spreading resistance microscopy
Author(s) -
T. Hakkarainen,
Olivier Douhéret,
S. Anand,
Lan Fu,
Hark Hoe Tan,
C. Jagadish
Publication year - 2010
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.3467138
Subject(s) - quantum dot , spreading resistance profiling , materials science , doping , microscopy , gallium arsenide , optoelectronics , characterization (materials science) , nanotechnology , optics , physics
T. Hakkarainen, O. Douheret, and S. Anand would like to acknowledge the Swedish Research Council VR for fi- nancial support and the Kurt-Alice Wallenberg KAW foundation for financing the microscope. L. Fu, H. H. Tan, and C. Jagadish would like to acknowledge the Australian Research Council ARC for financial support and Australian National Fabrication Facility ANFF for access to the facilities.
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