Open AccessErratum: ‘‘Temperature-dependent aluminum incorporation in AlxGa1−xAs layers grown by metalorganic vapor phase epitaxy’’ [J. Appl. Phys. 6 4, 195 (1988)]
Author(s) -
Wilfried van Sark,
G. Janßen,
M.H.J.M. de Croon,
Xiao Tang,
L.J. Giling,
W. M. Arnold Bik,
C. P. M. Dunselman,
F.H.P.M. Habraken,
W. F. van der Weg
Publication year - 1989
Publication title -
journal of applied physics
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.344505
Subject(s) - epitaxy , vapor phase , aluminium , phase (matter) , materials science , group 2 organometallic chemistry , chemistry , crystallography , condensed matter physics , thermodynamics , nanotechnology , physics , metallurgy , layer (electronics) , organic chemistry , molecule
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom