On the phase formation of sputtered hafnium oxide and oxynitride films | Zendy

K. Sarakinos | Zendy; Denis Mušić | Zendy; Stanislav Mráz | Zendy; Moritz to Baben | Zendy; K. Jiang | Zendy; F. Nahif | Zendy; A. Braun | Zendy; C. Zilkens | Zendy; Stéphanos Konstantinidis | Zendy; Fabian Renaux | Zendy; Damien Cossement | Zendy; Frans Munnik | Zendy; Jochen M. Schneider | Zendy

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On the phase formation of sputtered hafnium oxide and oxynitride films

Author(s) -

K. Sarakinos,

Denis Mušić,

Stanislav Mráz,

Moritz to Baben,

K. Jiang,

F. Nahif,

A. Braun,

C. Zilkens,

Stéphanos Konstantinidis,

Fabian Renaux,

Damien Cossement,

Frans Munnik,

Jochen M. Schneider

Publication year - 2010

Publication title -

journal of applied physics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.699

H-Index - 319

eISSN - 1089-7550

pISSN - 0021-8979

DOI - 10.1063/1.3437646

Subject(s) - hafnium , sputtering , materials science , high power impulse magnetron sputtering , sputter deposition , tetragonal crystal system , oxide , phase (matter) , analytical chemistry (journal) , crystal structure , thin film , zirconium , crystallography , chemistry , nanotechnology , metallurgy , organic chemistry , chromatography

Hafnium oxynitride films are deposited from a Hf target employing direct current magnetron sputtering in an Ar-O(2)-N(2) atmosphere. It is shown that the presence of N(2) allows for the stabilizati ...

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