Open AccessImproving mechanical robustness of ultralow-k SiOCH plasma enhanced chemical vapor deposition glasses by controlled porogen decomposition prior to UV-hardening
Author(s) -
Adam Urbanowicz,
Kris Vanstreels,
Patrick Verdonck,
Denis Shamiryan,
Stefan De Gendt,
Mikhaı̈l R. Baklanov
Publication year - 2010
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.3428958
Subject(s) - materials science , dielectric , porosity , composite material , hardening (computing) , amorphous solid , varnish , chemical vapor deposition , nanoindentation , microelectronics , curing (chemistry) , modulus , chemical engineering , nanotechnology , organic chemistry , chemistry , optoelectronics , layer (electronics) , engineering , coating
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