Open AccessOptical and microstructural properties versus indium content in InxGa1−xN films grown by metal organic chemical vapor deposition
Author(s) -
Anisha Gokarna,
A. Gauthier-Brun,
W. Liu,
Y. Androussi,
Éric Dumont,
El Hadj Dogheche,
Jinghua Teng,
S. J. Chua,
D. Décoster
Publication year - 2010
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.3425761
Subject(s) - indium , chemical vapor deposition , metalorganic vapour phase epitaxy , refractive index , materials science , dispersion (optics) , analytical chemistry (journal) , microstructure , spectroscopy , deposition (geology) , chemistry , optics , optoelectronics , metallurgy , epitaxy , nanotechnology , paleontology , sediment , biology , physics , layer (electronics) , chromatography , quantum mechanics
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