Evidence for amorphous multilayered silicon obtained by deposition under modulated pressure of hydrogen
Author(s) -
M. Vergnat,
B. George,
A. Bruson,
G. Marchal,
Ph. Mangin,
J.J. Demai
Publication year - 1988
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.341282
Subject(s) - silicon , materials science , hydrogen , amorphous silicon , scattering , deposition (geology) , nanocrystalline silicon , fabrication , amorphous solid , scanning electron microscope , optoelectronics , optics , crystallography , crystalline silicon , composite material , chemistry , medicine , paleontology , physics , alternative medicine , organic chemistry , pathology , sediment , biology
A new method of fabrication of layered structure of silicon is presented. The silicon was evaporated continuously under a modulated pressure of hydrogen. A contrast was dense and less dense silicon layers is evidenced by low‐angle x‐ray scattering and cross‐sectional electron microscopy.
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