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Erratum: Argon-oxygen interaction in rf sputtering glow discharges [J. Appl. Phys. 52, 6584 (1981)]
Author(s) -
C. R. Aita,
M.E. Marhic
Publication year - 1982
Publication title -
journal of applied physics
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.331661
Subject(s) - argon , sputtering , glow discharge , oxygen , atomic physics , materials science , chemistry , plasma , physics , thin film , nanotechnology , nuclear physics , organic chemistry

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