Atomistic analysis of phase segregation patterning in binary thin films using applied mechanical fields
Author(s) -
Alex M. Nieves,
V. Vítek,
Talid Sinno
Publication year - 2010
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.3309480
Subject(s) - materials science , annealing (glass) , binary number , stress relaxation , alloy , monte carlo method , embedded atom model , molecular dynamics , thin film , relaxation (psychology) , atom (system on chip) , microstructure , lattice (music) , thermodynamics , condensed matter physics , statistical physics , nanotechnology , metallurgy , computational chemistry , chemistry , physics , computer science , psychology , social psychology , creep , statistics , arithmetic , mathematics , acoustics , embedded system
The patterned compositional evolution in thin films of a binary alloy controlled by modulated stress fields is studied by employing Monte Carlo simulations. General features of stress-patterned phase segregation are probed using a binary Lennard-Jones potential in which the lattice misfit between the two components of the alloy is varied systematically. In general, patterning of the microstructure is found to be more robust in the low-mismatch binary systems because large lattice mismatch promotes plastic, and therefore, irreversible relaxation, during annealing. It is shown that some control over the relaxation process can be achieved by careful design of the applied thermal annealing history. Additional calculations have been performed using two other potentials for binary metallic systems, an embedded-atom method (EAM) potential for Cu–Ag and a modified embedded-atom method (MEAM) potential for Cu–Ni that represent examples of high and low-mismatched systems, respectively. The results obtained with gen...
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