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Note: Anodic bonding with cooling of heat-sensitive areas
Author(s) -
Peter C. K. Vesborg,
Jakob L. Olsen,
Toke R. Henriksen,
Ib Chorkendorff,
Ole Hansen
Publication year - 2010
Publication title -
review of scientific instruments
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.605
H-Index - 165
eISSN - 1089-7623
pISSN - 0034-6748
DOI - 10.1063/1.3277117
Subject(s) - anodic bonding , borosilicate glass , silicon , materials science , anode , thermal conductivity , thermal , composite material , metallurgy , thermodynamics , electrode , chemistry , physics
Anodic bonding of silicon to glass always involves heating the glass and device to high temperatures so that cations become mobile in the electric field. We present a simple way of bonding thin silicon samples to borosilicate glass by means of heating from the glass side while locally cooling heat-sensitive areas from the silicon side. Despite the high thermal conductivity of silicon, this method allows a strong anodic bond to form just millimeters away from areas essentially at room temperature.

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