Power-scaling performance of a three-dimensional tritium betavoltaic diode
Author(s) -
Baojun Liu,
Kevin P. Chen,
Nazir P. Kherani,
S. Źükotyński
Publication year - 2009
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.3272105
Subject(s) - microporous material , diode , materials science , tritium , planar , scaling , etching (microfabrication) , foil method , tritium illumination , optoelectronics , nuclear engineering , nuclear physics , nanotechnology , composite material , physics , geometry , mathematics , engineering , computer graphics (images) , layer (electronics) , computer science
Three-dimensional diodes fabricated by electrochemical etching are exposed to tritium gas at pressures from 0.05 to 33 atm at room temperature to examine its power scaling performance. It is shown that the three-dimensional microporous structure overcomes the self-absorption limited saturation of beta flux at high tritium pressures. These results are contrasted against the three-dimensional device powered in one instance by tritium absorbed in the near surface region of the three-dimensional microporous network, and in another by a planar scandium tritide foil. These findings suggest that direct tritium occlusion in the near surface of three-dimensional diode can improve the specific power production. © 2009 American Institute of Physics
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom