Low energy photoelectron diffraction analysis at high angular resolution of Cu and Mn/Cu surfaces
Author(s) -
Geoffrey Phillip Cousland,
Andrew E. Smith,
J.D. Riley,
A. P. J. Stampfl
Publication year - 2009
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.3253329
Subject(s) - overlayer , electron diffraction , diffraction , x ray photoelectron spectroscopy , low energy electron diffraction , reflection high energy electron diffraction , kinetic energy , materials science , electron , angular resolution (graph drawing) , electron backscatter diffraction , chemistry , atomic physics , analytical chemistry (journal) , molecular physics , physics , optics , nuclear magnetic resonance , quantum mechanics , combinatorics , chromatography , mathematics
X-ray photoelectron diffraction simulations using a real-space approach are Shown to accurately produce the extraordinarily detailed photoelectron diffraction pattern from Cu{111} at an electron kinetic energy of 523.5 eV. These same simulations show that most sensitivity is obtained when using low energy electrons at high angular resolution Structural differences are observed to be greatest around a kinetic energy of similar to 100 eV and many of the features observed in the photoelectron diffraction patterns may be directly related to phenomena observed in low energy electron diffraction patterns from the same Surface. For Cu{100}. simulations of buckled surfaces with a Mn overlayer predict that low energy photoelectron diffraction can easily discriminate chemical and structural differences. Even the effects of the relaxed Surface of Cu{100} is indeed observable along azimuthal scans around a kinetic energy of 100 eV Our results show that low energy photoelectron diffraction is extremely sensitive to changes in Surface Structure If high resolution patterns are acquired. © 2009, American Institute of Physics
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