Characterization of HfO[sub 2] and Hafnium Silicate Films on SiO[sub 2]∕Si | Zendy

Eric Bersch | Zendy; Maoyun Di | Zendy; Steven Consiglio | Zendy; Robert D. Clark | Zendy; G. J. Leusink | Zendy; Alain C. Diebold | Zendy; Erik M. Secula | Zendy; David G. Seiler | Zendy; Rajinder P. Khosla | Zendy; Daniel Herr | Zendy; C. Michael Garner | Zendy; Robert McDonald | Zendy

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Characterization of HfO[sub 2] and Hafnium Silicate Films on SiO[sub 2]∕Si

Author(s) -

Eric Bersch,

Maoyun Di,

Steven Consiglio,

Robert D. Clark,

G. J. Leusink,

Alain C. Diebold,

Erik M. Secula,

David G. Seiler,

Rajinder P. Khosla,

Daniel Herr,

C. Michael Garner,

Robert McDonald

Publication year - 2009

Publication title -

aip conference proceedings

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.177

H-Index - 75

eISSN - 1551-7616

pISSN - 0094-243X

DOI - 10.1063/1.3251260

Subject(s) - x ray photoelectron spectroscopy , hafnium , materials science , ellipsometry , dielectric , annealing (glass) , high κ dielectric , analytical chemistry (journal) , atomic layer deposition , silicate , thermal stability , optoelectronics , layer (electronics) , thin film , nanotechnology , zirconium , chemical engineering , chemistry , metallurgy , chromatography , engineering

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