Multi-technique characterization of arsenic ultra shallow junctions in silicon within the ANNA consortium | Zendy

D. Giubertoni | Zendy; G. Pepponi | Zendy; Burkhard Beckhoff | Zendy; Philipp Hoenicke | Zendy; S. Gennaro | Zendy; Florian Meirer | Zendy; Dieter Ingerle | Zendy; Georg Steinhäuser | Zendy; M. Fried | Zendy; P. Petrik | Zendy; A. Parisini | Zendy; M Reading | Zendy; Christina Streli | Zendy; Jaap van den Berg | Zendy; M. Bersani | Zendy; Erik M. Secula | Zendy; David G. Seiler | Zendy; Rajinder P. Khosla | Zendy; Dan Herr | Zendy; C. Michael Garner | Zendy; Robert McDonald | Zendy; Alain C. Diebold | Zendy

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Multi-technique characterization of arsenic ultra shallow junctions in silicon within the ANNA consortium

Author(s) -

D. Giubertoni,

G. Pepponi,

Burkhard Beckhoff,

Philipp Hoenicke,

S. Gennaro,

Florian Meirer,

Dieter Ingerle,

Georg Steinhäuser,

M. Fried,

P. Petrik,

A. Parisini,

M Reading,

Christina Streli,

Jaap van den Berg,

M. Bersani,

Erik M. Secula,

David G. Seiler,

Rajinder P. Khosla,

Dan Herr,

C. Michael Garner,

Robert McDonald,

Alain C. Diebold

Publication year - 2009

Publication title -

aip conference proceedings

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.177

H-Index - 75

eISSN - 1551-7616

pISSN - 0094-243X

DOI - 10.1063/1.3251258

Subject(s) - dopant , materials science , characterization (materials science) , silicon , optoelectronics , dopant activation , fluence , synchrotron radiation , ion implantation , analytical chemistry (journal) , doping , ion , nanotechnology , optics , chemistry , physics , organic chemistry , chromatography

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