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Understanding Imaging and Metrology with the Helium Ion Microscope
Author(s) -
Michael T. Postek,
András Vladár,
Bin Ming,
Erik M. Secula,
David G. Seiler,
Rajinder P. Khosla,
Dan Herr,
C. Michael Garner,
Robert McDonald,
Alain C. Diebold
Publication year - 2009
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.3251229
Subject(s) - metrology , nanotechnology , microscope , focused ion beam , resolution (logic) , microscopy , field ion microscope , materials science , optics , computer science , physics , ion , artificial intelligence , quantum mechanics
One barrier to innovation confronting all phases of nanotechnology is the lack of accurate metrology for the characterization of nanomaterials. Ultra‐high resolution microscopy is a key technology needed to achieve this goal. But, current microscope technology is being pushed to its limits. The scanning and transmission electron microscopes have incrementally improved in performance and other scanned probe technologies such as atomic force microscopy, scanning tunneling microscopy and focused ion beam microscopes have all been applied to nanotechnology with various levels of success. A relatively new tool for nanotechnology is the scanning helium ion microscope (HIM). The HIM is a new complementary imaging and metrology technology for nanotechnology which may be able to push the current resolution barrier lower. But, successful imaging and metrology with this instrument entails new ion beam/specimen interaction physics which must be fully understood. As a new methodology, HIM is beginning to show promise ...

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