Open AccessThickness Measurement of Thin-metal Films by Optical Metrology
Author(s) -
Vimal Kamineni,
M. Raymond,
Eric Bersch,
B. Doris,
Alain C. Diebold,
Erik M. Secula,
David G. Seiler,
Rajinder P. Khosla,
Daniel Herr,
C. Michael Garner,
Robert McDonald
Publication year - 2009
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.3251204
Subject(s) - materials science , ellipsometry , thin film , x ray photoelectron spectroscopy , electrical resistivity and conductivity , sputtering , analytical chemistry (journal) , auger electron spectroscopy , optics , nickel , metallurgy , chemistry , nuclear magnetic resonance , nanotechnology , physics , engineering , chromatography , nuclear physics , electrical engineering
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