Spectroscopic Ellipsometry Characterization of High-k films on SiO[sub 2]∕Si | Zendy

Ming Di | Zendy; Eric Bersch | Zendy; Steven Consiglio | Zendy; Tianhao Zhang | Zendy; Parul Tyagi | Zendy; Robert D. Clark | Zendy; Gert J. Leusink | Zendy; Arun R. Srivatsa | Zendy; Alain C. Diebold | Zendy; Erik M. Secula | Zendy; David G. Seiler | Zendy; Rajinder P. Khosla | Zendy; Daniel Herr | Zendy; C. Michael Garner | Zendy; Robert McDonald | Zendy

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Spectroscopic Ellipsometry Characterization of High-k films on SiO[sub 2]∕Si

Author(s) -

Ming Di,

Eric Bersch,

Steven Consiglio,

Tianhao Zhang,

Parul Tyagi,

Robert D. Clark,

Gert J. Leusink,

Arun R. Srivatsa,

Alain C. Diebold,

Erik M. Secula,

David G. Seiler,

Rajinder P. Khosla,

Daniel Herr,

C. Michael Garner,

Robert McDonald

Publication year - 2009

Publication title -

aip conference proceedings

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.177

H-Index - 75

eISSN - 1551-7616

pISSN - 0094-243X

DOI - 10.1063/1.3251202

Subject(s) - materials science , ellipsometry , hafnium , silicate , annealing (glass) , stack (abstract data type) , analytical chemistry (journal) , spectroscopy , characterization (materials science) , wavelength , thin film , optoelectronics , zirconium , chemistry , nanotechnology , physics , organic chemistry , chromatography , quantum mechanics , computer science , metallurgy , programming language , composite material

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