Open AccessLaser annealing of ion implanted silicon
Author(s) -
C. W. White,
J. Narayan,
R. T. Young
Publication year - 1979
Publication title -
aip conference proceedings
Language(s) - Uncategorized
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.31669
Subject(s) - dopant , materials science , annealing (glass) , ion implantation , silicon , laser , optoelectronics , epitaxy , irradiation , ruby laser , ion , doping , analytical chemistry (journal) , optics , nanotechnology , chemistry , metallurgy , physics , organic chemistry , layer (electronics) , nuclear physics , chromatography
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