Temperature dependent carrier lifetime studies on Ti-doped multicrystalline silicon
Author(s) -
Bijaya Paudyal,
Keith R. McIntosh,
Daniel Macdonald
Publication year - 2009
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.3139286
Subject(s) - ingot , silicon , materials science , wafer , hall effect , carrier lifetime , atmospheric temperature range , doping , titanium , range (aeronautics) , electron capture , electron , analytical chemistry (journal) , atomic physics , condensed matter physics , electrical resistivity and conductivity , metallurgy , optoelectronics , thermodynamics , chemistry , composite material , nuclear physics , physics , alloy , chromatography , quantum mechanics
This work was funded by an Australian Research Council Linkage Grant between the Australian National University, SierraTherm Production Furnaces, and SunPower Corporation. D.H.M. is supported by an Australian Research Council fellowship.
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