Open AccessRadiation damage to amorphous carbon thin films irradiated by multiple 46.9 nm laser shots below the single-shot damage threshold
Author(s) -
L. Juha,
V. Hájková,
J. Chalupský,
V. Vorlı́ček,
A. Ritucci,
A. Reale,
Paola Zuppella,
M. Störmer
Publication year - 2009
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.3117515
Subject(s) - materials science , irradiation , fluence , optics , laser , extreme ultraviolet , pulse duration , thin film , sputter deposition , ultraviolet , analytical chemistry (journal) , sputtering , optoelectronics , chemistry , nanotechnology , physics , nuclear physics , chromatography
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