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Phase-change memory devices based on gallium-doped indium oxide
Author(s) -
S.-L. Wang,
C.-Y. Chen,
M.-K. Hsieh,
W.-C. Lee,
A. H. Kung,
L.H. Peng
Publication year - 2009
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.3089238
Subject(s) - indium , gallium , materials science , bixbyite , doping , amorphous solid , phase change memory , crystallization , phase transition , phase (matter) , crystallite , nanosecond , oxide , optoelectronics , analytical chemistry (journal) , condensed matter physics , crystallography , nanotechnology , chemistry , metallurgy , optics , laser , physics , organic chemistry , layer (electronics) , chromatography
[[abstract]]We report repetitive phase-change memory (PCM) activity via the high- to low-resistance state transition in gallium-doped indium oxide (Ga:InO) induced by nanosecond electric pulses. The amorphous-to-crystalline phase transition of Ga:InO is found to occur at a crystallization temperature of ∼250 °C with an activation energy of 1.27±0.07 eV. At the phase transition, we observe a change in two orders of magnitude in the PCM-device resistance, which can be correlated with the formation of (211) and {222} crystallites of bixbyite cubic In2O3. We ascribe the phase-change mechanism to the Joule heating effect in Ga:InO.[[fileno]]2030165010003[[department]]電機工程學

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