Open AccessErratum: “Noble gas retention in the target during rotating cylindrical magnetron sputtering” [Appl. Phys. Lett. 93, 061501 (2008)]
Author(s) -
Stijn Mahieu,
Wouter Leroy,
Diederik Depla,
S. Schreiber,
W. Möller
Publication year - 2009
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.3086270
Subject(s) - sputter deposition , sputtering , materials science , noble gas , optoelectronics , cavity magnetron , physics , nanotechnology , atomic physics , thin film
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