Open AccessImproved silicon surface passivation achieved by negatively charged silicon nitride films
Author(s) -
Klaus Weber,
Hao Jin
Publication year - 2009
Publication title -
applied physics letters
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.3077157
Subject(s) - passivation , silicon nitride , materials science , locos , silicon , optoelectronics , strained silicon , nanocrystalline silicon , nitride , carrier lifetime , silicon oxide , silicon dioxide , layer (electronics) , crystalline silicon , nanotechnology , composite material , amorphous silicon
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