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Secondary electron emission from freely supported nanowires
Author(s) -
Makoto Suzuki,
Kazuhiro Kumagai,
Takashi Sekiguchi,
Alan M. Cassell,
Tsutomu Saito,
Cary Y. Yang
Publication year - 2008
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.3032910
Subject(s) - nanowire , secondary emission , materials science , electron , scanning electron microscope , cathode ray , silicon , nanostructure , monte carlo method , secondary electrons , electron beam induced deposition , atomic physics , yield (engineering) , nanotechnology , molecular physics , optoelectronics , scanning transmission electron microscopy , chemistry , composite material , physics , statistics , mathematics , quantum mechanics
We present secondary electron (SE) emission results from freely supported carbon/silicon nitride (Si3N4) hybrid nanowires using scanning electron microscopy. We found that, contrary to bulk materials, the SE emission from insulating or electrically isolated metallic nanowires is strongly suppressed by the penetrating beam. A mechanism of the SE suppression by the positive specimen charging is proposed, which is based on a total emission yield calculation using the Monte Carlo technique. This finding provides an important basis for studying low-energy electron emission from nanostructures under a penetrating electron beam.

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