Characteristics of CoxTi1−xO2 thin films deposited by metal organic chemical vapor deposition | Zendy

Adam McClure | Zendy; A. Kayani | Zendy; Y. U. Idzerda | Zendy; Elke Arenholz | Zendy; Edna Mae D. Cruz | Zendy

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Characteristics of CoxTi1−xO2 thin films deposited by metal organic chemical vapor deposition

Author(s) -

Adam McClure,

A. Kayani,

Y. U. Idzerda,

Elke Arenholz,

Edna Mae D. Cruz

Publication year - 2008

Publication title -

journal of applied physics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.699

H-Index - 319

eISSN - 1089-7550

pISSN - 0021-8979

DOI - 10.1063/1.2998971

Subject(s) - chemical vapor deposition , thin film , cobalt , materials science , combustion chemical vapor deposition , ferromagnetism , magnetism , metal , deposition (geology) , metalorganic vapour phase epitaxy , titanium , inorganic chemistry , carbon film , chemical engineering , chemistry , nanotechnology , metallurgy , epitaxy , layer (electronics) , condensed matter physics , paleontology , physics , sediment , engineering , biology

This paper deals with the growth and characterization of ferromagnetic cobalt doped TiO{sub 2} thin films deposited by liquid precursor metal organic chemical vapor deposition (MOCVD) using a new combination of the source materials Co(TMHD){sub 3}, tetrahydrofuran (THF), and titanium isopropoxide (TIP). An array of experiments reveals the intrinsic ferromagnetic nature of the grown films, and suggests that the magnetism is not generated by oxygen vacancies

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