Cavity ring-down spectroscopy sensor for ion beam etch monitoring and end-point detection of multilayer structures | Zendy

Lei Tao | Zendy; Azer P. Yalin | Zendy; Naoji Yamamoto | Zendy

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Cavity ring-down spectroscopy sensor for ion beam etch monitoring and end-point detection of multilayer structures

Author(s) -

Lei Tao,

Azer P. Yalin,

Naoji Yamamoto

Publication year - 2008

Publication title -

review of scientific instruments

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.605

H-Index - 165

eISSN - 1089-7623

pISSN - 0034-6748

DOI - 10.1063/1.2995765

Subject(s) - materials science , manganese , spectroscopy , sputtering , optoelectronics , cavity ring down spectroscopy , ion beam , ion , beam (structure) , laser , detection limit , continuous wave , optics , analytical chemistry (journal) , thin film , nanotechnology , chemistry , chromatography , physics , organic chemistry , quantum mechanics , metallurgy

This contribution reports on the development of in situ sputter monitoring and end-point detection for ion beam etch systems using continuous-wave cavity ring-down spectroscopy (cw-CRDS). The demonstrated system is based on the detection of sputtered manganese atoms using a tunable external cavity diode laser in the vicinity of 403.07 nm. The cw-CRDS system is described and measurements from a manganese-iron target are presented. End-point detection is demonstrated by monitoring the time dependence of manganese concentration for a multilayer target comprised of alternating layers of manganese/iron and titanium. Detection limits are shown to be adequate for today's commercial ion beam sputter systems.

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