Intermixing and chemical structure at the interface between n-GaN and V-based contacts
Author(s) -
Sujitra Pookpanratana,
Ryan M. France,
Marcus Bär,
L. Weinhardt,
O. Fuchs,
M. Blum,
Wanli Yang,
Jonathan D. Denlinger,
T. D. Moustakas,
Clemens Heske
Publication year - 2008
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2992199
Subject(s) - auger electron spectroscopy , ohmic contact , x ray photoelectron spectroscopy , vanadium , materials science , annealing (glass) , excited state , metal , electron spectroscopy , crystallography , chemistry , atomic physics , nanotechnology , nuclear magnetic resonance , physics , layer (electronics) , nuclear physics , metallurgy , composite material
The interface between n-type GaN and V-based contacts was characterized by soft x-ray spectroscopy. We have investigated the chemical interface structure before and after a rapid thermal annealing (RTA) step, which is crucial for the formation of an Ohmic contact. X-ray photoelectron and x-ray excited Auger electron spectra suggest that RTA induces an accumulation of metallic Ga at the surface. Using x-ray emission spectroscopy, we find that the probed nitrogen atoms are in a VN-like environment, indicating that vanadium interacts with nitrogen atoms from the GaN to form VN.
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