Open AccessErratum: “Pressure dependence of SiO2 growth kinetics and electrical properties on SiC” [J. Appl. Phys. 103, 023522 (2008)]
Author(s) -
Emily A. Ray,
John Rozen,
Sarit Dhar,
L. C. Feldman,
John R. Williams
Publication year - 2008
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.2958315
Subject(s) - kinetics , materials science , condensed matter physics , thermodynamics , physics , quantum mechanics
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