Mechanical behavior of ultralow-dielectric-constant mesoporous amorphous silica | Zendy

M. Rauf Gungor | Zendy; James J. Watkins | Zendy; Dimitrios Maroudas | Zendy

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Mechanical behavior of ultralow-dielectric-constant mesoporous amorphous silica

Author(s) -

M. Rauf Gungor,

James J. Watkins,

Dimitrios Maroudas

Publication year - 2008

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.2949556

Subject(s) - materials science , amorphous solid , dielectric , mesoporous material , microelectronics , composite material , mesoporous silica , modulus , molecular dynamics , scaling , elastic modulus , condensed matter physics , nanotechnology , crystallography , optoelectronics , chemistry , computational chemistry , organic chemistry , geometry , mathematics , physics , catalysis

Using molecular-dynamics simulations, we examine the mechanical behavior of mesoporous amorphous silicas that are considered as ultralow-dielectric-constant materials in microelectronics. We study structures with a regular array of spherical pores and densities between 88% and 72% of the amorphous silica normal density. We find that the Young modulus depends on density according to a sublinear power-law scaling relationship and decreases with decreasing mesopore size. Upon uniaxial compression, an elastic instability is triggered in structures with less-than-critical density or mesopore size

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