On the role of surface tensions and process conditions in detachment nanolithography | Zendy

Jae Kwan Kim | Zendy; Kahp Y. Suh | Zendy

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On the role of surface tensions and process conditions in detachment nanolithography

Author(s) -

Jae Kwan Kim,

Kahp Y. Suh

Publication year - 2008

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.2937143

Subject(s) - nanolithography , wetting , silicon , materials science , nanoscopic scale , nanotechnology , dip pen nanolithography , substrate (aquarium) , phase diagram , nanostructure , adhesion , phase (matter) , fabrication , chemistry , composite material , optoelectronics , medicine , oceanography , alternative medicine , organic chemistry , pathology , geology

We report on the role of intrinsic (adhesion force and wettability) and extrinsic (temperature and pressure) conditions to fabricate dense nanoscale patterns in detachment nanolithography. A phase diagram is constructed by using a rigiflex polymeric mold, an organic film, and silicon or gold substrate. Operating conditions in terms of surface tensions and processing parameters are discussed along with comparison of the minimum resolution with a simple theory.

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