Power scaling of an extreme ultraviolet light source for future lithography | Zendy

E. Wagenaars | Zendy; Felix Küpper | Zendy; Jürgen Klein | Zendy; W. Neff | Zendy; Marcel Damen | Zendy; Pieter van der Wel | Zendy; Dominik Vaudrevange | Zendy; Jeroen Jonkers | Zendy

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Power scaling of an extreme ultraviolet light source for future lithography

Author(s) -

E. Wagenaars,

Felix Küpper,

Jürgen Klein,

W. Neff,

Marcel Damen,

Pieter van der Wel,

Dominik Vaudrevange,

Jeroen Jonkers

Publication year - 2008

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.2924299

Subject(s) - extreme ultraviolet lithography , extreme ultraviolet , lithography , scalability , bandwidth (computing) , scaling , ultraviolet , power (physics) , optics , computer science , physics , optoelectronics , telecommunications , laser , geometry , mathematics , quantum mechanics , database

For future lithography applications, high-power extreme ultraviolet (EUV) light sources are needed at a central wavelength of 13.5 nm within 2% bandwidth. We have demonstrated that from a physics point of view the Philips alpha-prototype source concept is scalable up to the power levels required for high-volume manufacturing (HVM) purposes. Scalability is shown both in frequency, up to 100 kHz, and pulse energy, up to 55 mJ collectable EUV per pulse, which allows us to find an optimal working point for future HVM sources within a wide parameter space

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