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Vacancy-mediated dopant diffusion activation enthalpies for germanium
Author(s) -
A. Chroneos,
H. Bracht,
Robin W. Grimes,
Blas P. Uberuaga
Publication year - 2008
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2918842
Subject(s) - gallium , indium , germanium , dopant , enthalpy , impurity , silicon , antimony , diffusion , tin , vacancy defect , materials science , aluminium , chemistry , doping , inorganic chemistry , thermodynamics , crystallography , metallurgy , physics , optoelectronics , organic chemistry
Electronic structure calculations are used to predict the activation enthalpies of diffusion for a range of impurity atoms (aluminium, gallium, indium, silicon, tin, phosphorus, arsenic, and antimony) in germanium. Consistent with experimental studies, all the impurity atoms considered diffuse via their interaction with vacancies. Overall, the calculated diffusion activation enthalpies are in good agreement with the experimental results, with the exception of indium, where the most recent experimental study suggests a significantly higher activation enthalpy. Here, we predict that indium diffuses with an activation enthalpy of 2.79eV, essentially the same as the value determined by early radiotracer studies.

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