Open AccessErratum: “High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering” [J. Appl. Phys. 102, 113303 (2007)]
Author(s) -
André Anders,
Joakim Andersson,
Arutiun P. Ehiasarian
Publication year - 2008
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.2875523
Subject(s) - high power impulse magnetron sputtering , sputtering , sputter deposition , impulse (physics) , materials science , voltage , optoelectronics , condensed matter physics , atomic physics , physics , thin film , nanotechnology , quantum mechanics
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