Plasma power measurement and hysteresis in the E–H transition of a rf inductively coupled plasma system
Author(s) -
A. M. Daltrini,
Stanislav A. Moshkalev,
T. J. Morgan,
R. B. Piejak,
W. G. Graham
Publication year - 2008
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2844885
Subject(s) - inductively coupled plasma , hysteresis , argon , plasma , atomic physics , metastability , plasma parameters , materials science , electron density , plasma diagnostics , chemistry , analytical chemistry (journal) , condensed matter physics , physics , organic chemistry , quantum mechanics , chromatography
An experimental investigation of the argon plasma behavior near the E-H transition in an inductively coupled Gaseous Electronics Conference reference cell is reported. Electron density and temperature, ion density, argon metastable density, and optical emission measurements have been made as function of input power and gas pressure. When plotted versus plasma power, applied power corrected for coil and hardware losses, no hysteresis is observed in the measured plasma parameter dependence at the E-H mode transition. This suggests that hysteresis in the E-H mode transition is due to ignoring inherent power loss, primarily in the matching system. (c) 2008 American Institute of Physics
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