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Observation of oxide precipitates in InN nanostructures
Author(s) -
SoonYong Kwon,
Zaiyuan Ren,
Qian Sun,
Jung Han,
Young-Woon Kim,
Euijoon Yoon,
Bo Hyun Kong,
Hyung Koun Cho,
Il-Joong Kim,
Hyeonsik Cheong
Publication year - 2007
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2822396
Subject(s) - indium , oxide , materials science , metalorganic vapour phase epitaxy , nanostructure , chemical vapor deposition , chemical engineering , inorganic chemistry , nanotechnology , chemistry , optoelectronics , metallurgy , epitaxy , layer (electronics) , engineering
We observed the formation of oxide precipitates (bcc-In(2)O(3)) in InN nanostructures formed during metal-organic chemical vapor deposition (MOCVD) and/or subsequent postgrowth procedures in H(2) ambient. It was found that InN is extremely unstable in H(2) ambient and the activation energy of N(2) desorption of InN is measured to be similar to 0.28 eV, which is one order of magnitude smaller than that of reported value of InN in vacuum. Instability of InN nanostructures under H(2) ambient together with residual oxidant in the reactor facilitates the formation of indium oxide precipitates in the nanostructure matrix during MOCVD or the oxidation of residual indium at the surface, resulting in indium oxide dots.open3

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